Streaming and removal forces due to second-order sound field during megasonic cleaning of silicon wafers

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Vasseur, Jerome O. | Deymier, P. | Vasseur, J. | Khelif, A. | Djafari-Rouhani, Bahram | Dobrzynski, L. | Raghavan, S.

Edité par HAL CCSD ; American Institute of Physics

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